High yield micro- LED production calls for optimized device transfer from wafer to micro-display levels which also drives the requirements for micro-LED sputter systems. As device structures get thinner and device densities on the wafer get higher, the requirements for PVD production platforms and processes get even more stringent. The future needs of the Optoelectronics industry for such tools and components will be addressed in this talk including an optimized deposition environment and process control.
Dr. Stefan Seifried studied in the field of chemistry and materials science at Darmstadt, University of Technology, Germany, and earned his degree in field of oxide and carbide based nano-crystalline films by a modified CVD. After various management positions in the vacuum deposition and machine building he took over the BU Optoelectronics of Swiss-based Evatec AG in August 2018.