PRESENTATION

Enabling As/P Epitaxy at Scale for Photonics, Optoelectronics, and Solar

The rapid expansion of AI is accelerating the demand for faster, more efficient optical transceivers, putting pressure on manufacturers to deliver higher performance at scale. At the heart of these systems are Indium phosphide (InP) lasers, enabled by high-quality MOCVD epitaxy. This presentation will introduce Veeco’s innovative Lumina® series for As/P epitaxy and highlight the key performance, uniformity, and productivity benefits that make it the ultimate MOCVD production platform for scalable InP laser manufacturing, while also supporting a broad range of optoelectronic devices such as microLED and high-performance multi-junction solar cells.