PRESENTATION

In-situ metrology and ex-situ wafer mapping for compound semiconductor manufacturing

In this talk we will show, how state-of-the-art metrology can be applied along the manufacturing chain of optoelectronic devices, such as VCSELs, edge-emitting lasers and LEDs. We begin with in-situ metrology, applied for process control during MOVPE-growth. In a second step, we will show how post-epi wafer mapping provides additional uniformity information. Finally, as a third step, we will show examples of in-situ metrology during the subsequent plasma-etch process. It will be shown that especially the knowledge of metrology results from earlier steps allows for a much deeper understanding and that the combination of metrology results from different steps is key for a more comprehensive process control.