In this talk we will show, how state-of-the-art metrology can be applied along the manufacturing chain of optoelectronic devices, such as VCSELs, edge-emitting lasers and LEDs. We begin with in-situ metrology, applied for process control during MOVPE-growth. In a second step, we will show how post-epi wafer mapping provides additional uniformity information. Finally, as a third step, we will show examples of in-situ metrology during the subsequent plasma-etch process. It will be shown that especially the knowledge of metrology results from earlier steps allows for a much deeper understanding and that the combination of metrology results from different steps is key for a more comprehensive process control.
Dr. Kolja Haberland is Chief Technology Officer (CTO) at LayTec, a leading manufacturer of integrated metrology for the compound semiconductor industry. He studied physics at the Technical University of Berlin, where in 2003 he obtained his PhD for his work on 'optical in-situ monitoring during epitaxial growth' - LayTec’s major field of application for many years. As co-founder of the company, he has been with LayTec since 1999. Over the years, he has contributed significantly to the rapid growth of this technology company, providing both industry and academia with integrated metrology solutions for epitaxy of LEDs, lasers, transisors and solar cells.