PRESENTATION

Driving Adoption of GaN for Power Electronics via 300mm Technology

Gallium Nitride continues to make inroads into the Power Electronics market due to its higher conversion efficiencies and superior performance. While the initial adoption was limited to fast chargers, GaN power devices are now looking to other applications such as power supplies for datacenters and electric vehicles. Analysts continue to project a five-fold growth over the next 5 years as market share for GaN power devices continues to grow. To enable this growth, it is important for GaN power devices to be cost-competitive, and 300mm offers a pathway towards significant cost reductions. Metal Organic Chemical Vapor Deposition (MOCVD) technology is an important first step in the manufacturing of GaN-based power devices. As such, this deposition step plays a key role in the performance and cost of such devices. Veeco’s PROPEL® 300mm MOCVD tool based on single-wafer technology enables the highest quality deposition at the lowest cost per device. In this presentation, we focus on key improvements to Veeco’s PROPEL® 300mm MOCVD tool to enable penetration of GaN- based power devices.